In the photolithography process, light is used to transfer a geometric pattern through a mask to a photosensitive resist on a substrate. This lithographic method is mainly used in the semiconductor fabrication. The main limitation of this method is the wavelength of the used light, which imposes the geometrical size of fabricated structures -  hence only structures down to 1µm are possible.


Mit PhotoLitho hergestellte Gold-Strukturen

Gold structures produced with photolithography