Nanoimprint Lithography in batch (UV-NIL and Hot-Embossing)

In nanoimprint lithography a geometric pattern is created by the mechanical deformation of the imprint resist. That means, a patterned stamp is pressed into the liquid resin and the resin is then hardened either by UV light or heat. Hence, the nanoimprint lithography is an advanced method for creating patterns down to the nanometer range at a low cost.