Properties of DLC and Nitrogen doped DLC films Deposited by DC Magnetron Sputtering

Publication from Materials

Kahn M., Menegazzo N., Mizaikof B., Berghauser R., Lackner J.M., Hufnagel D., Waldhauser W.

Plasma Processes and Polymers 4 (S1), pp. S200-S204, 2007


Diamond-like carbon (a-C) and nitrogen-doped amorphous carbon (a-C:Nx) films were synthesised by direct current (DC) magnetron sputtering. Films were characterised for their chemical structure and nitrogen content by applying Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). The data collected demonstrates that sputtering power densities in the range of approximately 6.7-20 W · cm-2 have no apparent influence on the film structure. The ratio of the intensities of the D- and G-bands (ID/IG) in the Raman spectra resulted in a value of 1.56 ± 0.04 for a film deposited at power density of 6.7 W · cm-2 indicating a high sp3-hybridised carbon fraction at low sputtering power. Sputtering with pure nitrogen as the plasma gas resulted in a nitrogen concentration of 25.7 ± 1.6 at.-% in the film. Moreover, it was shown that the total pressure in the deposition chamber ranging from 1.8 × 10-3 to 3.5 × 10-3 mbar did not adversely affect the chemical structure and growth rate of the films.

Download (340 kB)