Properties of DLC and Nitrogen doped DLC films Deposited by DC Magnetron Sputtering
Publication from Materials
Plasma Processes and Polymers 4 (S1), pp. S200-S204, 2007
Diamond-like carbon (a-C) and nitrogen-doped amorphous carbon (a-C:Nx) films were synthesised by direct current (DC) magnetron sputtering. Films were characterised for their chemical structure and nitrogen content by applying Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). The data collected demonstrates that sputtering power densities in the range of approximately 6.7-20 W · cm-2 have no apparent influence on the film structure. The ratio of the intensities of the D- and G-bands (ID/IG) in the Raman spectra resulted in a value of 1.56 ± 0.04 for a film deposited at power density of 6.7 W · cm-2 indicating a high sp3-hybridised carbon fraction at low sputtering power. Sputtering with pure nitrogen as the plasma gas resulted in a nitrogen concentration of 25.7 ± 1.6 at.-% in the film. Moreover, it was shown that the total pressure in the deposition chamber ranging from 1.8 × 10-3 to 3.5 × 10-3 mbar did not adversely affect the chemical structure and growth rate of the films.