Materials

Scientific publication

Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

Publication from Materials

R. Timm, Alexander Fian, M. Hjort, C. Thelander, E. Lind, J. N. Andersen, L.-E. Wernersson, A. Mikkelsen

Appl. Phys. Lett. 97, 132904 , 2010