Room-Temperature Deposition of DLC Films by an Ion Beam Method, Reactive Magnetron Sputtering and Pulsed Laser Deposition: Process Design, Film Structure and Film Properties

The present work consequently investigates the structure of DLC films deposited by employing an anode layer source. Additionally, magnetron sputtering of carbon and silicon targets evaporated in Ar/acetylene (C₂H₂) process gas atmosphere is investigated. DLC films deposited by infrared PLD (IR-PLD; 1064 nm) and ultraviolet PLD (UV-PLD; 248 nm) are investigated further within the thesis. Consequently, Raman spectroscopy as the most important technique for the direct characterisation of the bonding structure of DLC films and related carbons [43-46] is a major part of the present thesis and will be used to provide the basic understanding of process parameters and their influence on the structure of the room-temperature deposited DLC films.

Furthermore, as too weak adhesion, too high coating process temperatures and improper diamond-like carbon structure formation etc. on different types of substrates represent still major challenges in DLC coating technology, the present thesis investigates the applicability of the developed films on different substrates.

Therefore, the aims of the present thesis are defined as follows:

• Development of new process variants of PVD and ion beam deposition processes by employing an anode layer source ion beam process, pulsed laser deposition and reactive magnetron sputtering for the deposition of diamond-like carbon films well adherent on temperature sensitive substrates (coating temperature should be kept well below 100°C)

• Identification of tailoring process parameters and subsequent process tuning in a fashion to obtain highly defect free films with unique properties on different kinds of substrates (silicon, glass, aluminium-alloys, fluorine-polymers, polymers, steels, ZnSe-crystals)

• Investigation of the deposited films due to their structural, chemical, mechanical, surface and surface chemistry properties

• Correlation of process parameters with film structure in order to achieve basic process understanding

• Subsequent correlation of film structure with film properties (hydrogen barrier properties, surface topography, surface energy) in order to achieve a scientific basis for future studies

• Provide scientific basis for Raman spectroscopy of carbon phases and enlighten the relation between Raman band parameters of DLC films and their mechanical properties

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