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R2R NANOIMPRINT LITHOGRAPHY

Roll-to-Roll plant at JOANNEUM RESEARCH Materials

Large-area micro- and nanostructuring

Our roll-to-roll nanoimprint lithography (roll-to-roll NIL, R2R NIL) facilitates continuous and therefore cost-effective production of micro and nanopatterns on large-area flexible substrates targeting electronic, optoelectronic, photovoltaic and sensoric applications, film processing and packaging as well as pharmaceuticals and biosciences.

R2R NIL is a revolutionary step forward, based on discontinuous embossing processes (batch nanoimprint lithography techniques) introduced in the 1990s.

Our R2R activities are one of the core topics within the Micro and Nanostructuring group (Director: Barbara Stadlober).

3D-Nano-Structures in Roll-to-Roll

The R2R pilot line allows us:

  • to sustainably produce highly resolved conductive elements for organic electronics (thinconductors, nanoscale electrodes for organic transistors), 
  • to precisely create optical 2.5D structures for the light management in flexible films (coupling and outcoupling, light guiding) for applications in photonics,
  • to realize 3D-structured bionic surfaces and complex nanopatterns on a large scale, which allow the artificial imitation of biological characteristics (shark skin, lotus effectgecko effect, structural colors), 
  • to produce complex microfluidic elements on foil for bioanalytic lab-on-foil systems in a cost-effective way, and
  • to continuously produce optimized high-tech film surfaces for packaging, decoration, safety and labeling, which display improved optical, mechanical and chemical behavior due to their micro and nanostructural properties.
For further infomation please contact
Materials
Phone:+43 316 876-3103
Fax+43 316 8769-3103
E-maildieter.nees@joanneum.at
News
  • Ultra-fast high-Resolution camera for inline monitoring installed