Deposition of TiN thin films on three dimensional shaped tools by pulsed laser deposition

Publikation aus Materials

Lackner J.M., Waldhauser W., Lenz W., Ebner R. , Major B., Schöberl T.

Proc. Materials Week, 30 September - 2 October, Munich, Paper No. 378, 10/2002


Because of its high hardness and low wear rates titanium nitride (TiN) is the most widespread material for hard coatings. Thin TiN films have been deposited industrially in recent years with various deposition methods. For coating of heat sensitive materials and machine parts at low temperatures down to room temperatures only a few deposition techniques can be applied. One of these is the pulsed laser deposition (PLD) method, which was used in this work for the deposition of TiN thin films on three-dimensional shaped substrated. A Nd:YAG laser of 1064nm wavelength was applied to vaporize titanium targets in low pressure N2 atmospheres at room temperature. As substrate materials for the deposition of the TiN films a high speed tool steel (DIN 1.3343) and a corrosion resistant steel (DIN 1.4542) were used. The substrate surfaces were situated parallel (on-axis) and rectangular (off-axis) to the target surface to simulate film deposition on three-dimensional shaped tools. The films were examined by light-microscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD), nano-indentation and pin-on-disk tests. The results indicate, that the PLD method is suitable for deposition of crystalline, strong textured TiN films with a very low surface roughness, with an excellent adhesion to the substrates, with a high hardness and a high wear resistance.

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