Properties of TiO<sub>2</sub> thin films deposited by RF magnetron sputtering
Publikation aus Materials
J. Optoel. Adv. Mat. 9(5), pp. 1446-1449, 2007
2 thin films deposited by RF magnetron sputtering have been investigated. The films were deposited on glass, ITO/glass and silicon at room temperature. The deposition was carried out in different experimental conditions, starting from a pure Ti target. We studied the influence of the experimental deposition parameters (power sputtering, Ar and O2 flow rate) on the film properties. The deposition typical conditions were 300-500 W, 10-45 sccm Ar, 3.3-30 sccm O2, at a pressure around 2.7×10-3 mbar. The film structure, morphology, deposition rate, and optical transmission were investigated. Rutile phase was obtained. The titania films deposited with a rate 4-16 nm/minute had 50-1500 nm thickness. Two kinds of TiO2 films have been obtained depending on the experimental conditions: nanocrystalline films with roughness of 3-10 nm and another one with droplets 2-8 μm. The optical transmission in the visible range was between 70 and 95%.