Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

Publikation aus Materials

R. Timm, A. Fian, M. Hjort, C. Thelander, E. Lind, J. N. Andersen, L.-E. Wernersson, A. Mikkelsen

Appl. Phys. Lett. 97, 132904 , 2010