Method

Scanning Electron Microscopy (SEM)

Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.

Equipment

  • JSM-IT 100 / JEOL
  • e-line / RAITH
  • Vega 3 / TESCAN

Method

High-resolution imaging with the options of chemical element analysis by energy dispersive X-ray spectroscopy (EDS) and electron beam (e-beam) lithography (EBL).

Expected Result

High resolution images of the nanostructure, particles and surfaces. EDS option: enables precise analysis of chemical properties, essential for understanding material composition and arrangement. EBL option: Fabrication of structured surfaces from nm – µm dimensions.

Case Study

A customer in material science requires detailed imaging and compositional analysis of a multilayer metal coating. The SEM captures high-resolution images of each layer’s topography, while EDS detects the elemental composition, revealing differences in the distribution of metals across the layers.

Scanning Electron Microscope SEM JSM-IT 100 / JEOL

Specifications

  • Maximum sample size: diameter 80 mm, height 35 mm
  • Sample loading and unloading time: ≤ 4 minutes
  • Resolution: nominal (diam. e-beam) 4 nm, in practice features down to ≈100nm resolved (reasonable magnification x30.000 at 128 mm x 96 mm image), depends heavily on sample. Requests of customers are checked individually.
  • Accelerating Voltage: 0.5 to 20 kV
  • Sample manipulation (stage): tilt -10° to 90° ; rotation 360° ; movement: 80 x 40 mm
  • Low vacuum option for non-conductive / out-gassing samples
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.

Vega 3 SEM + AZtec Energy-Dispersive X-ray Spectroscopy (EDX)

Specifications

  • OXFORD INSTRUMENTS AZtec energy dispersive X-ray spectroscopy detector (EDX)
  • Heated tungsten filament cathode
  • Wide Field Optics™ Technology with Intermediate Lens™ and In-Flight Beam Tracing™
  • Resolution:
    • High Vacuum Mode: 3 nm at 30 keV. 8 nm at 3 keV
    • Low Vacuum Mode: 3.5 nm at 30 keV with BSE detector
  • Maximum Field of View: >50 mm at max WD
  • Chemical element analysis by EDS (~0.1 wt.-% for sodium and heavier elements)
Scanning Electron Microscope (SEM) with EDS for high-resolution imaging and chemical element analysis of multilayer structures.

Scanning Electron Microscope SEM e-line / RAITH

Specifications

  • Max. sample size: 100 mm × 100 mm (4” wafer) on flat sample holder, 20 mm × 20 mm on tiltable / rotatable stage
  • Max. sample height: 20 mm
  • Max. acceleration voltage: 30 kV
  • Resolution: < 5 nm
  • Sample manipulation (RT stage): tilt up to 92° ; rotation 360°
  • Emitter type: Thermionic (tungsten emitter)
  • Surface needs intrinsic conductivity or will be coated (Au, W)
  • E-beam lithography option
Scanning Electron Microscope SEM, e-line / RAITH

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