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EVG770 Nanoimprint Lithography (NIL) Stepper

We use a specially modified EVG770 Nanoimprint Lithography (NIL) stepper for the large-scale production of micro- and nanostructures in UV imprint resins. Together with special materials and processes, we achieve the highest precision right down to practically seamless transitions between individual structures.

Step and Repeat-Anlage, Foto: JOANNEUM RESEARCH, Robert Stadler


  • Handling of large film substrates up to 700×380 mm²
  • Closing the gap between small-format masters and large-area working stamps by combining very high positioning accuracy with film-based high-throughput methods
  • Significantly greater process flexibility and further reduction in process costs
  • Customised replication of micro- and nanostructures in multifunctional coatings


Our offer

We offer our customers and partners research pilot lines for the development and implementation of new product ideas and manufacturing processes, from the idea to the prototype. The pilot line for roll-based micro- and nanostructuring at the MATERIALS Institute includes simulation, design and material development (coatings, imprint resins) and offers large-area structuring and structure replication from mastering to high-throughput production. The EVG770 NILStepper completes this pilot line with regard to the production of flexible working stamps for roller-based processes.

Find out more about our services in the area of Step and Repeat UV-nanoimprint lithography.


Your contact


Institute for Sensors, Photonics and Manufacturing Technologies
Franz-Pichler-Straße 30,

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