Synthesis of Graphene-layer Nanosheet Coatings by PECVD

Plasma enhanced chemical vapor deposition (PECVD) is a potentially industrially scalable route for graphene synthesis. Thin carbon coatings were deposited by PECVD from C₂H₂ and post-deposition irradiated by Ar⁺. Irradiation with 400 eV accelerated Ar⁺, deposition temperatures of 400 °C and post deposition annealing up to 800 °C result in crystal growth and graphitization, i.e. increased fraction of C-C sp² bonding. The same effect is achieved by deposition on copper and nickel foils, and interestingly on NaCl. For irradiated samples a two-layer graphene-layer nanosheet morphology is indicated from our characterization, with a variation of film properties across the film thickness.