Roll-to-Roll UV Nanoimprint Lithography for Large-Area Nano- and Micro-Structuring of Flexible Substrates

LpR 67 Article, page 50: Cost and time-efficient methods for the fabrication of optical elements are highly desirable in the field of lighting. Imprinting optical structures in combination with large area fabrication turns out to become an effective approach in this regard. In particular roll-to-roll UV nanoimprint lithography (R2R-UV-NIL) has a large potential to set new benchmarks for the fabrication of miniaturized, low-cost and low-weight optics that can be applied in many fields of applications. In the following, the Joanneum Research Forschungsgesellschaft m.b.H team, Claude Leiner, Stephan Ruttloff, Dieter Nees, Anja Haase, Ladislav Kuna, Wolfgang Nemitz, Franz-Peter Wenzl, Christian Sommer, Barbara Stadlober and Ursula Palfinger, led by Paul Hartmann, demonstrates the maturity of the related process chain, combining optical design, direct laser lithography, step&repeat imprinting for shim fabrication and R2R reproduction.