Materials
Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2
Publikation aus Materials
R. Timm, A. Fian, M. Hjort, C. Thelander, E. Lind, J. N. Andersen, L.-E. Wernersson, A. Mikkelsen
Appl. Phys. Lett. 97, 132904 , 2010