Materials

Wissenschaftliche Publikation

Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

Publikation aus Materials

R. Timm, A. Fian, M. Hjort, C. Thelander, E. Lind, J. N. Andersen, L.-E. Wernersson, A. Mikkelsen

Appl. Phys. Lett. 97, 132904 , 2010