Synthesis and optimization of tungsten oxide films produced by laser ablation

Publication from Materials

Shuntaro S., Suzuki T., Hirai M., Suematsu H., Grigoriu C., Sima C., Nicolae I., Waldhauser W., Lackner J. M.

J. Phys.: Conference Series 59 (1), pp. 297-300, 2007


This work was aimed at achieving an optimal deposition process by pulsed laser ablation (PLA) on large area substrates, using pure tungsten as target. The films were deposited at different: wavelengths (355/532/1064 nm), fluences (1.5, 5 and 10 J/cm2), oxygen pressures (100 and 200 mTorr), substrate temperatures (room temperature, 200, 300, and 400°C). The morpho-structural and compositional investigations have been carried out by profilometer, scanning electron microscopy, X-ray diffraction, Rutherford backscattering spectroscopy and Fourier transform infrared spectroscopy. The study has shown that optimal conditions for tungsten deposition on large area surfaces are at 355 nm/ 5 J/cm2. Amorphous, orthorhombic and triclinic phases WO3 films were obtained.

Download (253 kB)