Our roll-to-roll nanoimprint lithography (roll-to-roll NIL, R2R NIL) facilitates continuous and therefore cost-effective production of micro and nanopatterns on large-area flexible substrates targeting electronic, optoelectronic, photovoltaic and sensoric applications, film processing and packaging as well as pharmaceuticals and biosciences.
R2R NIL is a revolutionary step forward, based on discontinuous embossing processes (batch nanoimprint lithography techniques) introduced in the 1990s.
Our R2R activities are one of the core topics within the Micro and Nanostructuring group (Director: Barbara Stadlober).
The R2R pilot line allows us:
- to sustainably produce highly resolved conductive elements for organic electronics (thinconductors, nanoscale electrodes for organic transistors),
- to precisely create optical 2.5D structures for the light management in flexible films (coupling and outcoupling, light guiding) for applications in photonics,
- to realize 3D-structured bionic surfaces and complex nanopatterns on a large scale, which allow the artificial imitation of biological characteristics (shark skin, lotus effectgecko effect, structural colors),
- to produce complex microfluidic elements on foil for bioanalytic lab-on-foil systems in a cost-effective way, and
- to continuously produce optimized high-tech film surfaces for packaging, decoration, safety and labeling, which display improved optical, mechanical and chemical behavior due to their micro and nanostructural properties.
- UV nanoimprinting and hot embossing
- Rotogravure printing
- Inline monitoring
- Imprinting tools
- UV-NIL resists